Next-generation GaAs VCSEL Plasma Etch Process Technology


The market for Vertical Cavity Surface Emitting Lasers (VCSEL), which were invented in 1977 by Professor Iga of Tokyo Institute of Technology, has been expanding in recent years for optical communication and sensor applications. The production process of VCSELs requires plasma etching and plasma enhanced CVD equipment, and our products are used by many users worldwide from research and development to mass production. This paper introduces the latest plasma etching process examples of VCSEL on our ICP etching system RIE-400iP.

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